Deposition of solid solution films using reactive magnetron sputtering of a sandwich target

This work presents a magnetron with sputtering unit (sandwich target). The novel-$$$ty of the is due to three parallel plates different metals included in unit. They are mounted on same axis and rigidly attached it. located reactive environment consisting plasma-forming argon gas (nitrogen, oxy-$$$gen, etc.). lower plate cold, while middle outer ones operate hot target mode. In erosion zone plates, eight slits were made. locat-$$$ed symmetrically relative their center. sputtered through these slits. A above sandwich can be used for synthesis composite films three-compound solid solutions. possibility synthesizing Tix- MoyCr1–x–yN continuous change stoichiometric coefficients x y current density areas slits, which provide smooth hardness films, shown.